aalto1 untyped-item.component.html
Physical mechanisms of boron diffusion gettering of iron in silicon
Loading...
Access rights
openAccess
acceptedVersion
URL
Journal Title
Journal ISSN
Volume Title
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
This publication is imported from Aalto University research portal.
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
View publication in the Research portal (opens in new window)
View/Open full text file from the Research portal (opens in new window)
Unless otherwise stated, all rights belong to the author. You may download, display and print this publication for Your own personal use. Commercial use is prohibited.
Date
Department
Major/Subject
Mcode
Degree programme
Language
en
Pages
Series
Physica Status Solidi: Rapid Research Letters, Volume 4, issue 5-6, pp. 136-138
Description
Other note
Citation
Vähänissi, V, Haarahiltunen, A, Talvitie, H, Yli-Koski, M, Lindroos, J & Savin, H 2010, 'Physical mechanisms of boron diffusion gettering of iron in silicon', Physica Status Solidi: Rapid Research Letters, vol. 4, no. 5-6, pp. 136-138. https://doi.org/10.1002/pssr.201004105